cas 52858-59-0|| where to buy THPMA

Nom du produit:THPMA

IUPAC Name:oxan-2-yl 2-methylprop-2-enoate

Unité d'emballage	Stock disponible	Prix($)
CM561568-5g	in stock	ȀƄ
CM561568-10g	in stock	ŢưǕ
CM561568-25g	in stock	ƄŢǯ

Pour une utilisation en R&D uniquement..

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: N° CAS:52858-59-0; Formule moléculaire:C9H14O3; Point de fusion:-; Code SMILES:CC(C(OC1CCCCO1)=O)=C; Densité:

: Numéro de catalogue:CM561568; Poids moléculaire:170.21; Point d'ébullition:; N° Mdl:; Stockage:2-8°C, stored under nitrogen

: Tetrahydropyrans; Tetrahydropyran is an organic compound consisting of a saturated six-membered ring containing five carbon atoms and one oxygen atom. Tetrahydropyrans are common structural motifs in natural products and synthetic therapeutic molecules. In nature, these six-membered oxygen heterocycles are usually assembled by intramolecular reactions, including oxygen Michael addition or ring opening of epoxy alcohols. In fact, polyether natural products have been particularly extensively studied for their fascinating structures and important biological properties; these are often formed through endoselective epoxy open cascades.

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.