cas 266308-58-1|| where to buy ECPMA

Nom du produit:ECPMA

IUPAC Name:1-ethylcyclopentyl 2-methylprop-2-enoate

Unité d'emballage	Stock disponible	Prix($)	Quantité
CM202014-1g	3-4 Weeks	ƅňǺ

Pour une utilisation en R&D uniquement..

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: N° CAS:266308-58-1; Formule moléculaire:C11H18O2; Point de fusion:-; Code SMILES:CC(C(OC1(CC)CCCC1)=O)=C; Densité:

: Numéro de catalogue:CM202014; Poids moléculaire:182.26; Point d'ébullition:; N° Mdl:; Stockage:Store at 2-8°C.

: Cyclopentanes; Cyclopentane is a cycloalkane, an organic compound with a molecular formula of C5H10, a colorless and transparent liquid, insoluble in water, soluble in most organic solvents such as ethanol, ether, benzene, carbon tetrachloride, acetone, etc. It is mainly used as a solvent and chromatographic reference materials.; Cyclopentanes,where to buy Cyclopentanes; Cyclopentanes; Cyclopentane (also called C pentane) is a highly flammable alicyclic hydrocarbon with chemical formula C5H10 and CAS number 287-92-3, consisting of a ring of five carbon atoms each bonded with two hydrogen atoms above and below the plane. It occurs as a colorless liquid with a petrol-like odor.

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.