cas 123455-94-7|| where to buy 2-(2,2-Difluorovinyl)bicyclo[2.2.1]heptane

Nom du produit:2-(2,2-Difluorovinyl)bicyclo[2.2.1]heptane

IUPAC Name:2-(2,2-difluoroethenyl)bicyclo[2.2.1]heptane

Unité d'emballage	Stock disponible	Prix($)
CM201462-100mg	in stock	Ţƞư
CM201462-250mg	in stock	ŢȀƄ

Pour une utilisation en R&D uniquement..

Formulaire de demande

Nom chimique

Numéro CAS

Quantité*

Spécifications requises*
(% d'analyse, qualité du matériau, etc.)

Nom du contact*

Email du contact*

Meanwhile I'd like to create a registered account on CHEMENU.COM with the above email.

I'd like to receive emails related to products with similar structures to 123455-94-7 regularly via the above email.

Notes supplémentaires

Verification code*

refresh

: N° CAS:123455-94-7; Formule moléculaire:C9H12F2; Point de fusion:-; Code SMILES:F/C(F)=C/C1C(C2)CCC2C1; Densité:

: Numéro de catalogue:CM201462; Poids moléculaire:158.19; Point d'ébullition:150.5±15.0°C at 760 mmHg; N° Mdl:MFCD22194315; Stockage:Store at 2-8°C.

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

: Fluorinated compounds; Fluorinated compounds refers to organic or inorganic compounds containing fluorine.